China High quality Tungsten Sputtering Target Quotes, Factory, Manufacturers

Tungsten Sputtering Target

Brand :Xinkang

Product origin :Hunan,China

Delivery time :1-3 weeks

Supply capacity :1-2 tons / month

Tungsten Sputtering Target is produced by powder metallurgy technology, as a refractory metal, it has the highest melting point, as well as good corrosion resistance and environment friendly, normally used for making diffusion barrier film for semiconductor field. With up to 3N5 purity, high density, uniform grain size, lower gas content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.

 

Features

Chemical Composition: pure W

Available Purity: 3N5

Production Technology: powder metallurgy

Shapes: planar targets, rotary targets

Average Grain Size: < 100um  

 

Certificate of analysis of 3N5 pure Tungsten Sputtering Target

 Certificate of analysis for 99.95% tungsten sputtering target.jpg

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