China High quality Nickel Chromium Sputtering Target Quotes, Factory, Manufacturers

Nickel Chromium Sputtering Target

Brand :Xinkang

Product origin :Hunan,China

Delivery time :1-3 weeks

Supply capacity :1-2 tons / month

Nickel Chromium Sputtering Targets are produced by melting technology, it’s used for depositing NiCr thin film. As this material has relatively large resistivity, more resistant to oxidation and low temperature coefficient of resistance, so NiCr thin films are widely used for making resistors thin film for IC application. Nickel chromium sputtering targets can also applied for low-E glass coating. With up to 3N5 purity, uniform grain size, lower oxygen content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process.

 

Features

Chemical Composition: NiCr93/7wt%, NiCr90/10wt%, NiCr80/20wt%, NiCr70/30wt%, NiCr60/40wt%, NiCr40/60wt%

Segregation of weight: +/-0.5wt%

Available Purity: 2N8, 3N, 3N5

Production Technology: melting

Shapes: planar targets

 

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