China High quality Copper Sputtering Target Quotes, Factory, Manufacturers

Copper Sputtering Target

Brand :Xinkang

Product origin :Hunan,China

Delivery time :1-3 weeks

Supply capacity :1-5 tons / month

Copper Sputtering Targets are produced by melting technology, it’s widely applied for semiconductor, decorative coating and advanced packing field. With up to 5N purity, uniform grain size, lower gas content, end user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process. We also produce pure copper C10200, and oxygen free copper C10100 backing plates for customers, the biggest length is up to 1600mm.

 

Features

Chemical Composition: pure Cu

Available Purity: 3N5, 4N, 5N

Production Technology: melting

Shapes: planar targets, rotary targets

Average Grain Size: < 100um  

 

Certificate of analysis of 5N pure Copper sputtering target

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